Search Results
Showing 1 - 10 of 11 results
Search Results
Integrated circuit mask technology
| Location | Call # | Status |
|---|---|---|
| Joyner - General Stacks | HD9993.T693 U63 1997 | ✔ Available |
Accurate linewidth measurement on integrated-circuit photomasks
| Location | Call # | Status |
|---|---|---|
| Joyner - Fed Docs Stacks | C 13.10:400-43 | ✔ Available |
A production-compatible microelectronic test pattern for evaluating photomask misalignment
| Location | Call # | Status |
|---|---|---|
| Joyner - Fed Docs Stacks | C 13.10:400-51 | ✔ Available |
Optical and dimensional-measurement problems with photomasking in microelectronics
| Location | Call # | Status |
|---|---|---|
| Joyner - Fed Docs Stacks | C13.10:400-20 | ✔ Available |
Automated photomask inspection
| Location | Call # | Status |
|---|---|---|
| Joyner - Fed Docs Stacks | C 13.10:400-46 | ✔ Available |
Measurement assurance for dimensional measurements on integrated-circuit photomasks
| Location | Call # | Status |
|---|---|---|
| Joyner - Microforms B300 | C 13.46:1164 | ✔ Available |
/LC.GIF&client=easterncarolinaedu)
Federal statutory protection for mask works
| Location | Call # | Status |
|---|---|---|
| Joyner - Fed Docs Stacks | ASK AT REFERENCE DESK | ✔ Available |
Federal statutory protection for mask works
| Location | Call # | Status |
|---|---|---|
| Joyner - Fed Docs Stacks | LC 3.4/2:100/2004 | ✔ Available |
Antireflecting-chromium linewidth standard, SRM 473, for calibration of optical microscope linewidth measuring systems
| Location | Call # | Status |
|---|---|---|
| Joyner - Microforms B300 | C 13.10:260-129 | ✔ Available |