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Cover image for Accurate linewidth measurement on integrated-circuit photomasks

Accurate linewidth measurement on integrated-circuit photomasks

  • 1980
  • Format: Book
Location Call # Status
Joyner - Fed Docs Stacks C 13.10:400-43 ✔ Available
Cover image for Measurement assurance for dimensional measurements on integrated-circuit photomasks

Measurement assurance for dimensional measurements on integrated-circuit photomasks

Location Call # Status
Joyner - Microforms B300 C 13.46:1164 ✔ Available
Cover image for Antireflecting-chromium linewidth standard, SRM 473, for calibration of optical microscope linewidth measuring systems

Antireflecting-chromium linewidth standard, SRM 473, for calibration of optical microscope linewidth measuring systems

Location Call # Status
Joyner - Microforms B300 C 13.10:260-129 ✔ Available
Cover image for Optical and dimensional-measurement problems with photomasking in microelectronics

Optical and dimensional-measurement problems with photomasking in microelectronics

Location Call # Status
Joyner - Fed Docs Stacks C13.10:400-20 ✔ Available