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020 a| 9781306163538;

020 a| 1306163536 (E-Book)c| GBP 90.00 Retail Price (MyiLibrary)9| Active Record;

024 3 a| 9781306163538;

035 a| (WaSeSS)ssj0001049144;

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049 a| EREEa| NEHH;

245 00 a| Atomic Layer Deposition for Semiconductorsh| [electronic resource];

260 a| New York : b| Springera| La Vergne : b| MyiLibrary [Distributor];

300 a| 265 p.;

506 a| Available only to authorized users.;

520 8 a| Annotationb| This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for memories covers both mass-produced memories, such as DRAM and Flash, and emerging memories, such as PCRAM and FeRAM. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes. The final section on ALD for machines looks at toolsets and systems hardware. Each chapter provides the history, operating principles, and a full explanation of ALD processes for each device.;

538 a| Mode of access: World Wide Web;

650 4 a| Semiconductors;

650 4 a| Electrochemistry;

655 0 a| Electronic books.=| ^A491897;

856 40 z| Full text available from eBooks on EBSCOhostu| https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=654177&scope=site&custid=s5822723&authtype=ip,shib;

949 a| CLICK ON WEB ADDRESSw| ASISh| JOYNER188;

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999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 6742261-1001l| JNETm| JOYNERr| Ys| Yt| JNESSBKu| 7/15/2026x| EBOOKz| JERESOURCE;

999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 6742261-2001l| HSLELECm| HSLr| Ys| Yt| HEBKu| 7/15/2026x| EBOOKz| HERESOURCE;

999 a| CLICK ON WEB ADDRESSw| ASISc| 1i| 6742261-3001l| MNETm| JMUSICr| Ys| Yt| MNESSBKu| 7/15/2026x| EBOOKz| JERESOURCE;

Atomic Layer Deposition for Semiconductors

Format	Electronic
Publication Info	New York : Springer La Vergne : MyiLibrary [Distributor]
Description	265 p.
Supplemental Content	Full text available from eBooks on EBSCOhost
Subjects	Semiconductors Electrochemistry

Summary	Annotation This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for memories covers both mass-produced memories, such as DRAM and Flash, and emerging memories, such as PCRAM and FeRAM. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes. The final section on ALD for machines looks at toolsets and systems hardware. Each chapter provides the history, operating principles, and a full explanation of ALD processes for each device.
Access restriction	Available only to authorized users.
Technical details	Mode of access: World Wide Web
Genre/form	Electronic books.
ISBN	9781306163538
ISBN	1306163536 (E-Book) Active Record
Standard identifier#	9781306163538
Stock number	00024965

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Atomic Layer Deposition for Semiconductors

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