Handbook of Silicon Wafer Cleaning Technology
| Other author | Reinhardt, Karen Editor |
| Other author | Kern, Werner Editor |
| Format | Electronic |
| Edition | 3rd ed. |
| Publication Info | William Andrew [Imprint] San Diego : Elsevier Science & Technology Books Oxford : Elsevier Science & Technology [Distributor] |
| Description | 760 p. 09.000 x 06.000 in. |
| Supplemental Content | Full text available from eBook - Materials Science 2018 |
| Subjects |
| Summary | Annotation This volume provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. |
| Access restriction | Available only to authorized users. |
| Technical details | Mode of access: World Wide Web |
| Genre/form | Electronic books. |
| ISBN | 9780323510844 |
| ISBN | 0323510841 (Trade Paper) Active Record |
| Standard identifier# | 9780323510844 |
| Stock number | C2016-0-01001-X 00991439 |
Availability
| Library | Location | Call Number | Status | Item Actions |
|---|---|---|---|---|
| Electronic Resources | Access Content Online | ✔ Available |