MOS interface physics, process and characterization / Shengkai Wang and Xiaolei Wang.
| Author/creator | Wang, Shengkai, 1984- |
| Other author | Wang, Xiaolei, 1985- |
| Format | Electronic |
| Edition | First edition. |
| Publication Info | Boca Raton : CRC Press/Taylor & Francis Group, 2022. |
| Description | xi, 161 pages : illustrations ; 24 cm |
| Supplemental Content | Full text available from Taylor & Francis eBooks |
| Supplemental Content | Full text available from eBooks on EBSCOhost |
| Subjects |
| Abstract | "The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices and integrated circuits is high quality MOS structure. This book contains abundant experimental examples focusing on MOS structure. The volume will be an essential reference for academics and postgraduates within the field of microelectronics"-- Provided by publisher. |
| Bibliography note | Includes bibliographical references. |
| Access restriction | Available only to authorized users. |
| Technical details | Mode of access: World Wide Web |
| Genre/form | Electronic books. |
| LCCN | 2021017023 |
| ISBN | 9781032106274 (hbk.) |
| ISBN | 9781032106281 (pbk.) |
| ISBN | (ebk.) |
Availability
| Library | Location | Call Number | Status | Item Actions |
|---|---|---|---|---|
| Electronic Resources | ✔ Available |