Developments in Surface Contamination and Cleaning Wet and Dry Cleaning Methods

Other author Kohli, Rajiv
Other author Mittal, Kashmiri L.
Format Electronic
Publication InfoBurlington : William Andrew, Incorporated Saint Louis : Elsevier Science & Technology Books [Distributor]
Description234 p. 09.000 x 06.000 in.
Supplemental ContentFull text available from eBook - Materials Science 2014 [EBCMS14]

Summary Annotation Asdevice sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a wholeprovides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. This Volume complements other volumes in this series and: provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contaminationaddresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and otherscovers novel wet and dry surface cleaning methods of increasing commercial importance
Access restrictionAvailable only to authorized users.
Technical detailsMode of access: World Wide Web
Genre/formElectronic books.
ISBN9780323299619
ISBN032329961X (Trade Cloth) Active Record
Standard identifier# 9780323299619
Stock number00094317

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