Semiconductor Strain Metrology Principles and Applications
| Other author | Wong,Terence K. S. Editor |
| Format | Electronic |
| Publication Info | Oak Park : Bentham Science Publishers |
| Supplemental Content | Full text available from Ebook Central - Academic Complete |
| Summary | Annotation This book surveys the major and newly developed techniques for semiconductor strain metrology. Semiconductor strain metrology has emerged in recent years as a topic of great interest to researchers involved in thin film and nanoscale device characterization. This e-book employs a tutorial approach to explain the principles and applications of each technique specifically tailored for graduate students and postdoctoral researchers. Selected topics include optical, electron beam, ion beam and synchrotron x-ray techniques. Unlike earlier references, this e-book specifically discusses strain metrology with both depth and focus. |
| Access restriction | Available only to authorized users. |
| Technical details | Mode of access: World Wide Web |
| Genre/form | Electronic books. |
| ISBN | 9781608053599 |
| ISBN | 1608053598 (E-Book) Active Record |
| Standard identifier# | 9781608053599 |
| Stock number | 01479942 |
Availability
| Library | Location | Call Number | Status | Item Actions |
|---|---|---|---|---|
| Electronic Resources | Access Content Online | ✔ Available |