Characterization of multi temperature and multi RF chuck power grown silicon nitride films by PECVD and ICP vapor deposiiton / F. Semedy [and others].
| Author/creator | Semendy, Fred |
| Other author | U.S. Army Research Laboratory. |
| Format | Electronic |
| Publication Info | Adelphi, MD : Army Research Laboratory, [2010] |
| Description | 1 online resource (vi, 14 pages) : color illustrations. |
| Supplemental Content | https://purl.fdlp.gov/GPO/LPS124986 |
| Subjects |
| Variant title | Plasma enhanced chemical vapor deposition |
| Variant title | Inductive coupled plasma vapor deposition |
| Series | ARL-TR ; 5105 ARL-TR (Aberdeen Proving Ground, Md.) ; 5105. ^A566074 |
| General note | Title from PDF title screen (viewed on Aug. 6, 2010). |
| General note | "March 2010." |
| Bibliography note | Includes bibliographical references (p. 11). |
| GPO item number | 0324-A-01 (online) |
| Govt. docs number | D 101.133:5105 |
Availability
| Library | Location | Call Number | Status | Item Actions |
|---|---|---|---|---|
| Electronic Resources | Access Content Online | ✔ Available |