Tools

LEADER 03196cam a2200397 a 4500

001 962453;

005 20141212031550.0;

008 881201s1989 njua b 001 0 eng ;

010 a| 88038244;

020 a| 081551199X :c| $72.00;

035 a| (Sirsi) o18907337;

035 a| (OCoLC)18907337;

049 a| NPEE;

050 4 a| QC702.7.I55b| H36 1989;

082 0 a| 621.381/72| 19;

092 a| 621.381b| H19;

245 00 a| Handbook of ion beam processing technology :b| principles, deposition, film modification, and synthesis /c| edited by Jerome J. Cuomo and Stephen M. Rossnagel, Harold R. Kaufman.;

300 a| xviii, 438 pages :b| illustrations ;c| 25 cm;

336 a| text2| rdacontent;

337 a| unmediated2| rdamedia;

338 a| volume2| rdacarrier;

504 a| Includes bibliographies and index.;

505 0 a| Perspective on past, present and future uses of ion beam technology / Jerome J. Cuomo, Stephen M. Rossnagel and Harold R. Kaufman -- Gridded broad-beam ion sources / Harold R. Kaufman and Raymond S. Robinson -- Electron cyclotron resonance (ECR) ion sources / William M. Holber -- Hall effect ion sources / Raymond S. Robinson and Harold R. Kaufman -- Ionized cluster bean (ICB) deposition and epitaxy / Isao Yamada and Toshinori Takagi -- Quantitative sputtering / Peer C. Zalm -- Laser- induced fluorescence as a tool for the study of ion beam sputtering / Wallis F. Calaway ... [et al.] -- Characterization of atoms desorbed from surfaces by ion bombardment using multiphoton ionization detection / David L. Pappas, Nicholas Winograd and Fred M. Kimock.;

505 0 a| The application of positionization for sputtering studies and surface or thin film analysis / Hans Oechsner -- The modification of films by ion bombardment / Eric Kay and Stephen M. Rossnagel -- Control of film properties by ion-assisted deposition using broad beam sources / Ronnen A. Roy and Dennis S. Yee -- Etching with directed beams / Michael Geis ... [et al.] -- Film growth modification by concurrent ion bombardment : theory and simulation / Karl-Heinz Muller -- Interface structure and thin film adhesion / John Baglin -- Modification of thin films by off-normal incidence ion bombardment / R. Mark Bradley -- Ion beam interactions with polymer surfaces / Robert C. White and Paul S. Ho.;

505 0 a| Topography : texturing effects / Bruce A. Banks -- Methods and techniques of ion beam processes / Stephen M. Rossnagel -- Ion-assisted dielectric and optical coatings / Phil J. Martin and Roger P. Netterfield - - Diamond and diamond-like thin films by ion beam techniques / Makoto Kitabatake and Kiyotaka Wasa.;

650 0 a| Ion implantation.=| ^A44637;

650 0 a| Ion bombardmentx| Industrial applications.=| ^A246106;

700 1 a| Cuomo, J. J.=| ^A246107;

700 1 a| Rossnagel, Stephen M.=| ^A246108;

700 1 a| Kaufman, Harold R.=| ^A246109;

590 a| Little-285754--305130047626.;

596 a| 1;

998 a| 1710401;

999 a| QC702.7.I55 H36 1989w| LCc| 1i| 30372005338931d| 11/30/2020e| 8/31/2020l| JGESm| JOYNERn| 3r| Ys| Yt| JGESBKu| 5/16/1990x| BOOKz| JSTACKSo| .STAFF. 0;

Handbook of ion beam processing technology : principles, deposition, film modification, and synthesis / edited by Jerome J. Cuomo and Stephen M. Rossnagel, Harold R. Kaufman.

Other author	Cuomo, J. J.
Other author	Rossnagel, Stephen M.
Other author	Kaufman, Harold R.
Format	Book
Publication Info	Park Ridge, N.J., U.S.A. : Noyes Publications, ©1989.
Description	xviii, 438 pages : illustrations ; 25 cm
Subjects	Ion implantation. Ion bombardment--Industrial applications.

Contents	Perspective on past, present and future uses of ion beam technology / Jerome J. Cuomo, Stephen M. Rossnagel and Harold R. Kaufman -- Gridded broad-beam ion sources / Harold R. Kaufman and Raymond S. Robinson -- Electron cyclotron resonance (ECR) ion sources / William M. Holber -- Hall effect ion sources / Raymond S. Robinson and Harold R. Kaufman -- Ionized cluster bean (ICB) deposition and epitaxy / Isao Yamada and Toshinori Takagi -- Quantitative sputtering / Peer C. Zalm -- Laser- induced fluorescence as a tool for the study of ion beam sputtering / Wallis F. Calaway ... [et al.] -- Characterization of atoms desorbed from surfaces by ion bombardment using multiphoton ionization detection / David L. Pappas, Nicholas Winograd and Fred M. Kimock.
Contents	The application of positionization for sputtering studies and surface or thin film analysis / Hans Oechsner -- The modification of films by ion bombardment / Eric Kay and Stephen M. Rossnagel -- Control of film properties by ion-assisted deposition using broad beam sources / Ronnen A. Roy and Dennis S. Yee -- Etching with directed beams / Michael Geis ... [et al.] -- Film growth modification by concurrent ion bombardment : theory and simulation / Karl-Heinz Muller -- Interface structure and thin film adhesion / John Baglin -- Modification of thin films by off-normal incidence ion bombardment / R. Mark Bradley -- Ion beam interactions with polymer surfaces / Robert C. White and Paul S. Ho.
Contents	Topography : texturing effects / Bruce A. Banks -- Methods and techniques of ion beam processes / Stephen M. Rossnagel -- Ion-assisted dielectric and optical coatings / Phil J. Martin and Roger P. Netterfield - - Diamond and diamond-like thin films by ion beam techniques / Makoto Kitabatake and Kiyotaka Wasa.
Local note	Little-285754--305130047626.
Bibliography note	Includes bibliographies and index.
LCCN	88038244
ISBN	081551199X :

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Joyner	General Stacks	QC702.7.I55 H36 1989	✔ Available	Place Hold

Handbook of ion beam processing technology : principles, deposition, film modification, and synthesis / edited by Jerome J. Cuomo and Stephen M. Rossnagel, Harold R. Kaufman.

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