Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP / Dragan M. Pantic [and others] ; presented at the Dielectric Films on Compound Semiconductors Symposium sponsored by the Electrochemical Society, Honolulu, Hawaii, October 18-23, 1987.
| Format | Microform |
| Publication Info | [Washington, D.C.] : NASA ; Springfield, Va. : For sale by the National Technical Information Service, [1990] |
| Description | 15 pages : illustrations ; 28 cm. |
| Other author/creator | Pantic, Dragan M. |
| Other author/creator | Electrochemical Society. |
| Other author/creator | United States. National Aeronautics and Space Administration. |
| Other author/creator | Symposium on Dielectric Films on Compound Semiconductors. |
| Series | NASA technical memorandum ; 102544 NASA technical memorandum 102544. ^A467613 |
| General note | Cover title. |
| General note | CRDP Program record. |
| Bibliography note | Includes bibliographical references (page 13). |
| Reproduction note | Microfiche. [Washington, D.C. : National Aeronautics and Space Administration], 1990. 1 microfiche : negative. |
| Issued in other form | Online version: Pantic, Dragan M. Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP |
| GPO item number | 0830-D (MF) |
| Govt. docs number | NAS 1.15:102544 |
| Stock number | N 90-20393 NASA |
Availability
| Library | Location | Call Number | Status | Item Actions |
|---|---|---|---|---|
| Joyner | Microforms B300 | NAS 1.15:102544 | ✔ Available |